199D105X0035A6A1

Tantalum capacitors are widely used in the production and application of nearly all kinds of electronic products, they are built with a Ta metal core and a Ta-oxide layer to incur a capacitance between its leads. The 99D105X0035A6A1 capacitor is one of the most popular and well-known versions of this type, particularly due to its wide range of applications. Let\'s take a look at the application fields and working principle of the 99D105X0035A6A1 capacitor.

Application Fields

The 99D105X0035A6A1 capacitor is mainly used as a buffering element in electronic and communication devices, mainly due to its high level of stability, reliability and low leakage. It is often found in alternate current, DC and multimedia systems, and there are many cases in which it is a better choice than any other capacitor. Some more examples of its use are in satellite control systems, audio equipment and anti-interference circuits. Moreover, due to its miniature size and low weight, 99D105X0035A6A1 also frequently appears in notebook computers, mobile phones and other functional and mobile devices.

Working Principle

The working principle behind the 99D105X0035A6A1 is based on its construction, which consists of a Ta evaporated metal film and an Ta-oxide layer. This is all contained within an anodized case, and the capacitance is then created between the leads. The capacitance is determined by the dimension of the Ta, which allows the capacitor to transfer a charge from one side to the other and to store electric energy. On top of that, the capacitor is fully encapsulated to protect it from any external damages or influences.

Conclusion

In conclusion, the 99D105X0035A6A1 capacitor is one of the most popular and well-known versions of tantalum capacitors, with a wide range of applications in different fields. It can be used in alternated current, DC systems and anti-interference circuits, as well as in higher level such as satellite controls and audio equipment. Its working principle is based on the utilization of a Ta metal film and a Ta-oxide layer, both of which are contained within an anodized case. All this put together makes it a stable and reliable element with a high-level of performance.