650-642 Datasheet/PDF650-642 Application Field and Working Principle
650-642 is a type of photo resist material made from polyimides, a family of thermoplastic polymers used in the lithography field. Due to its properties such as film adhesion, chemical and dimensional stability, and thermal endurance, 650-642 has been used in a wide range of applications, including the fabrication of device components, printed circuit boards (PCBs), and integrated circuit (IC) interconnects. Its working principle is based on the photochemical reactions that are triggered by short-wavelength ultraviolet (UV) light.
When UV light is made to contact the photo resist material, photopolymerization takes place. This is a type of chemical reaction in which the monomers, or small molecules, undergo polymerization, or chain extension, to form polymers. When the short-wavelength UV light strikes the photosensitive layer of the photo resist material, a small amount of free radicals is produced and initiates polymerization. The reaction proceeds in a chain and as a result, molecular chains are formed which cross-link with each other.
In this case, the photo resist material is made up of long polymer chains linked together by cross-linking photopolymers. When UV light is shined on the material, the light triggers a bond-forming reaction between the monomers and the molecules of the photopolymer. These bonds are more stable than the bonds formed with the original monomer, resulting in a stronger, more durable material.
650-642 has unique properties that enable it to be used in a variety of industrial applications. Its high thermal stability and adhesion to various substrates, including metal and plastic, make it suitable for use in processes such as touchscreen coatings, as well as thin-film devices. Its chemical stability and dimensional stability enable it to be used in the fabrication of printed circuit boards (PCBs), as well as IC interconnects.
The working principle of 650-642 is simple. When exposed to UV light, the photo resist material undergoes a photochemical reaction that forms monomer molecules into polymers with enhanced physical and chemical properties. The bonds formed between the monomers and the molecules of the photopolymer have higher strength than the bonds formed between the monomers and the original monomer. The result is a stronger and more durable material capable of withstanding the harsh environmental conditions in industrial processes.
The application field of 650-642 is vast and diverse. Its unique properties make it suitable for use in a number of industries, including the fabrication of electronic components, coatings for touchscreens, and as a medium for printed circuit boards (PCBs). Its high thermal stability allows it to be used in processes such as circuit board laminating and soldering, as well as IC interconnects. Its dimensional stability allows it to be used in various types of device components and integrated circuit (IC) interconnects.
In conclusion, 650-642 is a unique photo resist material with a range of beneficial properties. Its working principle, based on photochemical reactions initiated by UV light, results in the formation of stronger, more durable materials with enhanced thermal and dimensional stability. Additionally, its high thermal and chemical stability make it suitable for a variety of industrial applications, including the fabrication of electronic components, printed circuit boards (PCBs), and integrated circuit (IC) interconnects.