8D717W06SA-LC

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<div class="Miscellaneous"><h1>8D717W06SA-LC application field and working principle</h1><p>8D717W06SA-LC, which belongs to the trigger type ECR (Electron Cyclotron Resonance) plasma source, modulates microwave electric field to generate high frequency ECR field. The device can stabilize the plasma production process by measuring the ECR field intensity.</p><p>This device is mainly used in many fields, including semiconductor process production, research and development, ultra-high vacuum vacuum coating, materials processing, surface processing, and environmental protection. 8D717W06SA-LC plasma source can provide a stable high frequency ECR field, which makes the process of producing high quality thin films extremely valuable in many industries.</p><p>Under the control of frequency, the 8D717W06SA-LC plasma source can accurately control the power of the ECR field and the thickness of the film. The device is programmed to allow the electronic microwave to generate two sets of alternating high-frequency magnetic field in the interaction space, which generates a symmetrical microwave electric field. The design of the remote microwave window ensures that the plasma can be safely produced in the reaction chamber and that the reactive ion molecules are released into the plasma reaction gas. As the ECR magnetic field passes through the reaction chamber, free electrons begin to interact and form a stable plasma.</p><p>In addition to providing a continuous plasma, the 8D717W06SA-LC plasma source can also reduce plasma damage to the substrate, reduce plasma back reaction rate, and produce uniform angle distribution. The device is equipped with a novel plasma detection module, which can continuously detect plasma parameters such as gas pressure, gas flow rate, power density, electron temperature, and magnetic field amplitude.</p><p>In conclusion, 8D717W06SA-LC is an important device in many industries, especially in the fields of semiconductor processing, ultra-high vacuum coating, materials processing and surface treatment. Its main function is to generate high frequency ECR field to stable the plasma process. Its feature of precisely controlling the power of the ECR field and the thickness of the film makes it extremely valuable in many industries.</p></div>

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