900002668

The 900002668 application field and working principle refer to the development of plasma-based technologies. It is an area of immense potential applications and interests, with a wide range of applications including Plasma coating, Etching, Ion implantation and Thin Film Deposition.

Plasma coating is a process by which a certain material is coated with a thin and uniform layer of the material, such as copper, molybdenum, or titanium, to increase its strength, decrease its weight, and thus improve its performance. In this process, a plasma is generated in a vacuum chamber with an electric field and the target material is heated to the point where it is in the plasma state. The ions present in the plasma are attracted to the target material surface, due to the force from the electric field, and react with the target material, coating it with the desired material.

Etching is the process of removing material from a solid surface, such as a substrate, in order to produce an area of desired dimensions and shapes. In this process, a plasma is generated in a chamber with an electric field and the target material is heated to the point where it is in the plasma state. Ions present in the plasma react with the target material’s surface, leading to the removal of material from the targeted area. This is used to fabricate semiconductors and devices with nano-scale features.

Ion implantation is the process by which ions are implanted into a material, such as semiconductor materials, to alter their nature. In this process, a plasma is generated in a vacuum chamber with an electric field and the target material is heated to the point where it is in the plasma state. Ions present in the plasma are attracted to the target material and react with the surface, thus altering its properties. This is used in the fabrication of semiconductors and devices with nano-scale features.

Thin film deposition is a process in which thin layers of a material, such as metals or oxides, are grown on a surface. In this process, a plasma is generated in a vacuum chamber with an electric field and the target material is heated to the point where it is in the plasma state. The ions present in the plasma are attracted to the target material surface, due to the force from the electric field, and react with the material, forming a thin and uniform layer of the desired material. This is used to fabricate semiconductors and devices with nano-scale features.

The 900002668 application field and working principle therefore refer to the development of a wide range of plasma-based technologies, from plasma coating and etching to thin film deposition and ion implantation. These technologies are used to create a wide range of materials and devices with nano-scale features and properties. This has enabled the field of nanotechnology to become one of the most prosperous, important, and rapidly developing areas of science and technology.