CN12931_LENA-W-DL

Due to market price fluctuations, if you need to purchase or consult the price. You can contact us or emial to us:   sales@allicdata.com

CN12931_LENA-W-DL is an advanced reflector optical module developed with the most advanced technology available for field and working principles. It utilizes a total internal reflection (TIR) principle, wherein a light source emitted from a base unit is reflected off of an internal reflective surface and then projected outward at the desired angle. This technology provides an effective combination of performance and versatility. The aim of the development was to create a high-performance general-purpose reflector to be used in fields such as optics, electronics, photonics, and other specialized applications.

The CN12931_LENA-W-DL reflector utilizes a single integrated optical platform to harness the light source in order to form a custom beam shape for various applications. It has four layer construction structure that enables TIR reflection, which directs the emitted light in the desired direction. This consists of a number of elements including hollow quartz cone, laser-level laser source, diffraction grating, and Fresnel lens, which are all designed and shaped to ensure maximum efficiency. With proper control and uniform layers, the angular reflectance for the CN12931_LENA-W-DL can be highly uniform and consistent throughout the range.

This reflector is thus well-suited for many applications, including photolithography, optical lithography, nano-scale lithography, and other nanomaterials engineering. It can also be used for various detective and medical inspections, including lithography of semiconductors and other symmetrical micron sized patterns. The reflector module is also suitable for matrix scanning applications such as barcode readers, and furthermore for display systems, and infrared optical applications.

Given the right combination of elements, the CN12931_LENA-W-DL can achieve a high field of view and wide angular range, with added features such as optical diffraction, brightness control, and chromatic aberration correction. Furthermore, its design is highly customizable and adaptable for various applications, providing a cost-effective and efficient solution to any given problem. Furthermore, the reflector can be able to take account of the conditions of the working environment, such as illumination and ambient illumination.

The CN12931_LENA-W-DL reflector module has been designed to be used in various fields where highly precise output of a wide range of incident angles is required. In medicine and biomedical related applications, it allows for accurate imaging of biological observables. Photolithography gives rise to extremely precise features and can be used for various fabrication techniques. It is used for electron and optical microscopy where it permits the digital tomography of nanolithography patterns.

Due to its versatility and low cost of integration, the CN12931_LENA-W-DL reflects are gaining fast acceptance in the optics industry. It is not only suitable for general-purpose reflector purposes, but can also be used in specialized applications such as semiconductor and optical component inspection. It is highly reliable and provides an extremely accurate output, which is especially beneficial for applications that require high precision output.

The CN12931_LENA-W-DL reflector module is thus suitable for various optics-related fields, offering superior performance in precision, reliability, and versatility, at a cost-effective solution for any application. With its advanced design and features, it is an ideal choice for designs and applications that require highly precise output with extended control and flexibility.

The specific data is subject to PDF, and the above content is for reference