FM21L16-60-TG Allicdata Electronics
Allicdata Part #:

FM21L16-60-TGRA-ND

Manufacturer Part#:

FM21L16-60-TG

Price: $ 0.00
Product Category:

Integrated Circuits (ICs)

Manufacturer: Cypress Semiconductor Corp
Short Description: IC FRAM 2M PARALLEL 44TSOP II
More Detail: FRAM (Ferroelectric RAM) Memory IC 2Mb (128K x 16)...
DataSheet: FM21L16-60-TG datasheetFM21L16-60-TG Datasheet/PDF
Quantity: 1000
Stock 1000Can Ship Immediately
Specifications
Series: F-RAM™
Packaging: Tray 
Part Status: Obsolete
Memory Type: Non-Volatile
Memory Format: FRAM
Technology: FRAM (Ferroelectric RAM)
Memory Size: 2Mb (128K x 16)
Write Cycle Time - Word, Page: 110ns
Access Time: 110ns
Memory Interface: Parallel
Voltage - Supply: 2.7 V ~ 3.6 V
Operating Temperature: -40°C ~ 85°C (TA)
Mounting Type: Surface Mount
Package / Case: 44-TSOP (0.400", 10.16mm Width)
Supplier Device Package: 44-TSOP II
Base Part Number: FM21L16
Description

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FM21L16-60-TG application field and working principle

FM21L16-60-TG is a type of silicon non-volatile memory, which belongs to the class of ferroelectric random access memories (FERAM). This type of semiconductor data storage was developed by Fujitsu Microelectronics Inc. and is widely used in various memory applications. The FM21L16-60-TG FERAM consists of a single-transistor cell, which is connected to an input/output port with a small number of metal lines. The cell consists of two components- the ferroelectric layer and the substrate layer.

The FM21L16-60-TG FERAM memory cell is fabricated on a monocrystalline silicon substrate. The ferroelectric layer is composed of a binary compound of titanium dioxide (TiO2) and strontium boron (SrB) saturated with a small number of dopants. It has a dielectric constant of 600 and an effective ferroelectric polarization of 60 kilocoulombs per square centimeter. This memory cell is capable of storing up to 16Kbits of data. It operates at a clock frequency of up to 100MHz, with a write/erase time of 1ms.

The working principle of the FM21L16-60-TG memory cell is based on the polarization of the ferroelectric layer. The applied voltage of the ferroelectric layer determines the polarization of this layer. When the voltage is positive, electrons and electron vacancies will move in the opposite direction, resulting in an increased polarization of the layer. When the voltage is negative, electrons and electron vacancies will move in the same direction and the polarization of the layer will decrease. In the case of a properly biased device, the ferroelectric layer will retain its polarization until the applied voltage changes.

The FM21L16-60-TG memory cell can be used in both write and read modes. In the write mode, an appropriate voltage is applied to the ferroelectric layer to induce a change in polarization. The data to be written is stored as a binary state in the ferroelectric layer. In the read mode, an appropriate voltage is applied to the ferroelectric layer and the change in polarization can be measured. The data stored in the ferroelectric layer can then be read out.

The FM21L16-60-TG FERAM memory cell has a wide range of applications. It is suitable for use in embedded applications, such as aerospace, automotive, medical, industrial, and defense systems. It is also suitable for use in mobile products and wireless communication devices. In addition, the FM21L16-60-TG FERAM memory cell can be used in data storage systems, RFID readers, and industrial sensors.

The FM21L16-60-TG FERAM memory cell is a reliable and efficient data storage solution. It offers fast write and read speeds, low power consumption, and high data storage density. It is also highly reliable and immune to environmental effects such as temperature and humidity. This makes it an ideal solution for a wide range of memory applications.

The specific data is subject to PDF, and the above content is for reference

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