Allicdata Part #: | IL-S-C3-10000-ND |
Manufacturer Part#: |
IL-S-C3-10000 |
Price: | $ 0.00 |
Product Category: | Uncategorized |
Manufacturer: | JAE Electronics |
Short Description: | CONNECTOR |
More Detail: | N/A |
DataSheet: | IL-S-C3-10000 Datasheet/PDF |
Quantity: | 1000 |
1 +: | 0.00000 |
Series: | * |
Part Status: | Last Time Buy |
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IL-S-C3-10000, also known as Intelligent Layer Selective Coating is an advanced combination of physical vapor deposition (PVD) and chemical vapor deposition (CVD) technologies. It is used for developing coatings for electronic components and consumer products.
The technology behind IL-S-C3-10000 combines physical vapor deposition (PVD) and chemical vapor deposition (CVD) to produce metal-oxide and metal-silicate coatings with excellent electrical, dielectric, optical, and other properties. The physical vapor deposition (PVD) process uses a high-energy beam, such as an electron beam or ion beam, to sputter or vaporize a material from a target. The chemical vapor deposition (CVD) process then deposits a unique, nano-structured layer of metal-oxide or metal-silicate onto the substrate.
The main advantage of the IL-S-C3-10000 technology is its ability to produce metal-oxide and metal-silicate coatings with highly uniform properties at a relatively lower cost. This makes it an attractive option for developing cost-effective solutions for a wide range of electronics, consumer products, and other industrial applications.
The IL-S-C3-10000 technology is used to coat a wide range of materials including stainless steel, copper, aluminum, copper oxide, titanium, and tungsten. It is also used to coat aluminum oxide, titanium nitride, tantalum nitride, and other precious and semi-precious metals. It is ideal for coating substrates with thin layers, which is particularly useful for manufacturing electronic components.
The principle behind the IL-S-C3-10000 technology is quite simple. First, a sputtering source is used to vaporize the target material. Once the vaporized material hits the substrate, it begins to form a thin layer of metal-oxide or metal-silicate. This layer then becomes a protective coating for the substrate, providing improved electrical, optical, dielectric, and other properties.
The IL-S-C3-10000 technology has a wide range of application fields. As mentioned earlier, it is used to develop coatings for electronic components and consumer products. In the electronics industry, it is used for coating electrical conductors, printed circuit boards, microelectronics, and optoelectronics. In the consumer products sector, it is used to coat a wide range of materials including plastics, composites, and alloys.
The IL-S-C3-10000 technology also has applications in other sectors such as solar cells and medical implants. In solar cells, its high-quality coatings improve the efficiency of energy conversion. In medical implants, its corrosion-resistant coatings protect against undesirable biological effects.
In conclusion, IL-S-C3-10000 is a unique combination of physical vapor deposition (PVD) and chemical vapor deposition (CVD) technologies. It is used to produce metal-oxide and metal-silicate coatings with excellent electrical, dielectric, optical, and other properties. It has wide application field in electronics, consumer products, solar cells, and medical implants. This makes it an attractive option for developing cost-effective solutions for a wide range of applications.
The specific data is subject to PDF, and the above content is for reference
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