IPC-610BP-50HBE

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IPC-610BP-50HBE, which stands for "Inductively Coupled Plasma - High Density Broadband Electron Cyclotron Resonance - 50 kW Broadband" is an advanced plasma source developed by Sino-US Joint Innovation Center for Applied Plasma Technology at Beihang University. It is designed for high-density broad-band electron cyclotron resonance (ECR) plasmas, and is mainly used in laboratory research of plasma material processing technologies.

The IPC-610BP-50HBE plasma source consists of a unipolar circle magnet, an annular magnetic ring, and a power supply system. The unipolar circle magnet is formed by connecting four magnet coils around a circular plate, and the annular magnetic ring is formed by interconnecting three ring-shaped magnets. The magnetic field generated by these two magnetic fields intersects at the centre of the circular plate, forming a highly uniform static magnetic field. This overlaps with the fields generated by the power supply system, which creates a steady uniform ECR plasma. The static magnetic field is adjustable by changing the applied current in the magnets, which allows for the creation of different plasma conditions.

Working Principle: The working principle of the IPC-610BP-50HBE is based on the ECR plasma source technology. In an ECR plasma source, the circular magnet provides a uniform static magnetic field that is uniform along the axial direction of the plasma. This, in combination with the strong electric field generated by the power supply system, confines the electrons in the system to move along curved trajectories and makes them ineffective to propagate beyond a narrow region surrounding the center of the source. This creates high-density plasmas with higher ionization efficiency and lower electron temperatures.

Application Field: The IPC-610BP-50HBE is designed for high-density broad-band ECR plasmas, and is mainly used in laboratory research of plasma material processing technologies. It can be used for surface processing such as dielectric etching, metal deposition, and passivation. In addition, it is also used in the production of high-temperature superconductors, illustrated optical films, and micro- and nano-fiber production. Furthermore, it can be used for carbon nanotube and graphene production, and for purification of rare earth materials. This plasma source can be used in both laboratory and industrial settings.

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