M39003/03-2015/HSD

Due to market price fluctuations, if you need to purchase or consult the price. You can contact us or emial to us:   sales@allicdata.com

Tantalum Capacitors: M39003/03-2015/HSD Application Field and Working Principle

Tantalum capacitors are electronic components that increase in popularity due to their high-density, high-reliability, and low-cost advantages. Uniquely, the capacitors are constructed with tantalum metal with a thin oxide layer deposited on the metal’s surface, acting as the dielectric material. This makes a much smaller physical size than other capacitors, allowing for greater storage capacity and efficient layout and design.

The M39003/03-2015/HSD is a special type of tantalum capacitor that is mainly used in military and aerospace applications. It is designed to provide high capacitance in a small package size, and is highly reliable over a wide operating temperature range. The main features of the M39003/03-2015/HSD capacitors include:

• A wide range of capacitance values
• High volumetric efficiency
• High reliable operating temperature range
• High temperature operation
• High current capability
• High frequency operation

Application Field

M39003/03-2015/HSD tantalum capacitors are mainly used in high-performance, high-reliability applications such as military and aerospace systems. The capacitors are typically used for filtering, energy storage, and noise suppression applications.

The M39003/03-2015/HSD capacitors offer many advantages such as: greater capacitance values than other types of capacitors due to the thin oxide layer of tantalum used; the capacitance remains stable regardless of high temperature changes; and the small physical size offers opportunities for efficient designs. The capacitors can also perform at high frequencies and can handle high current.

Working Principle

M39003/03-2015/HSD tantalum capacitors are constructed using a metal tantalum element with an oxide layer used as the dielectric material. This construction leads to a higher capacitance value for the same size component. The oxide used in this construction is a thin layer that is created or “grown” from hydrolysis reaction of the tantalum element.

The M39003/03-2015/HSD capacitors work by storing an electrical charge on the dielectric oxide between the two metal plates, or anodes of the capacitor. When an electrical voltage is applied to the capacitor the electric charge is then stored on the dielectric and the capacitor is said to be “charged”. The capacitance value is determined by the size and dielectric material used within the capacitor.

These capacitors are available in a wide variety of sizes and shapes, and can handle very high voltage and current in a wide operating temperature range. In addition, the tantalum oxide layer acts as a barrier to electric field breakdown, allowing the capacitor to withstand high voltage impulses without failing. This makes them well-suited for applications in harsh and hazardous environments.

Conclusion

M39003/03-2015/HSD capacitors represent a reliable, cost-effective, and high-performance solution for military and aerospace applications. Their efficiency, high capacitance values, and low physical size makes them ideal for many applications. The unique thin oxide layer used in their construction also offers an additional advantage in high temperature and high voltage applications.

The specific data is subject to PDF, and the above content is for reference