Allicdata Part #: | 350-2193-ND |
Manufacturer Part#: |
OPAA1WSL |
Price: | $ 0.83 |
Product Category: | Optoelectronics |
Manufacturer: | Dialight |
Short Description: | LENS WIDE SUB 12DEG XLAMP |
More Detail: | Lens, Sub Lens Clear 30° Wide LUXEON, Osram Golden... |
DataSheet: | OPAA1WSL Datasheet/PDF |
Quantity: | 4510 |
Lead Free Status / RoHS Status: | Lead free / RoHS Compliant |
Moisture Sensitivity Level (MSL): | 1 (Unlimited) |
1 +: | $ 0.75600 |
10 +: | $ 0.61425 |
25 +: | $ 0.47250 |
100 +: | $ 0.42525 |
250 +: | $ 0.37800 |
500 +: | $ 0.32130 |
1000 +: | $ 0.26460 |
2500 +: | $ 0.25137 |
5000 +: | $ 0.24570 |
Series: | OPA |
Part Status: | Active |
Lead Free Status / RoHS Status: | -- |
Type: | Lens, Sub Lens |
Moisture Sensitivity Level (MSL): | -- |
Color: | Clear |
Number of LEDs: | 1 |
Lens Style: | Round with Flat Top |
Lens Size: | 26mm Dia |
Lens Transparency: | Diffused |
Optical Pattern: | Wide |
Viewing Angle: | 30° |
For Use With/Related Manufacturer: | Osram |
Material: | Acrylic |
Mounting Type: | Snap In |
Due to market price fluctuations, if you need to purchase or consult the price. You can contact us or emial to us: sales@allicdata.com
Optical Approximate Aberration Analysis (OPAA) is a technique used to accurately measure the aberrations of optical systems. OPAA uses a white-light source to measure the system\'s wavefront quality and is often used to optically characterize lens systems. The technique is useful in designing and characterizing the performance of lenses used in various imaging systems.
An OPAA system consists of two main components: a white-light source and an imaging system. The white-light source is used to create a broad spectrum of light wavefronts that emanate from a single point. The imaging system is then used to measure the quality and parameters of the wavefronts. The imaging system may consist of an array of CCD (charge-coupled device) cameras, lenses, mirrors, or any combination of optics.
The working principle of an OPAA system is based on the Fraunhofer diffraction theory. When a white-light source is incident on a lens, the diffraction of light will cause the white light to form a series of interference patterns. The pattern of interference caused by the lens is referred to as a wavefront or an interference pattern. This wavefront can be measured by the imaging system and used to analyze the aberrations of the optical system.
Using the Fraunhofer diffraction theory, it is possible to calculate the expected wavefronts for a given optical system, allowing for comparison between the expected wavefronts and the measured wavefronts. By comparing the two wavefronts, one can determine the amount of performance degradation due to aberrations. This information can then be used to characterize the performance of a given lens system and aid in designing and optimizing new lens systems.
OPAA is highly useful in the characterization of lenses for the design and optimization of imaging systems. The technique allows for the accurate and precise measurement of the wavefronts of optical systems, which in turn can be used to determine the aberrations of the systems. The information provided by OPAA is invaluable in the design of optimized optical systems, as it provides a means for characterizing the performance of existing optics and designing new optics with improved performance.
The specific data is subject to PDF, and the above content is for reference
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