Allicdata Part #: | KPT45521-410-ND |
Manufacturer Part#: |
KPT45521-410 |
Price: | $ 31.89 |
Product Category: | Uncategorized |
Manufacturer: | ITT Cannon, LLC |
Short Description: | KPT 4C 4#20 SKT RECP |
More Detail: | N/A |
DataSheet: | KPT45521-410 Datasheet/PDF |
Quantity: | 1000 |
1 +: | $ 28.99260 |
5 +: | $ 25.45200 |
10 +: | $ 24.79620 |
25 +: | $ 23.22210 |
50 +: | $ 21.64760 |
Specifications
Series: | * |
Part Status: | Active |
Description
Due to market price fluctuations, if you need to purchase or consult the price. You can contact us or emial to us: sales@allicdata.com
MiscellaneousUnderstanding the application field and working principle of KPT45521-410 is important in order to harness the full potential of this device. Cut through the jargon, and this guide will help shed light on the functions and features of this great machine. KPT45521-410 is a microprocessor-controlled 400mm wafer cleaner and surface conditioner for back-end of line (BEOL) processes. The device uses a wide variety of solvents and cleaning agents to clean and condition the surface of the wafer. It is a versatile tool for multiple applications, including cleaning, deglazing, polishing, and deburring. The KPT45521-410 can also be used for substrate preparation and related functions. The device uses a large number of processing parameters, ranging from substrate size to the cleaning solution to the process parameters. The user can select the desired parameters depending on the application or process. The KPT45521-410 is divided into two components: the mainframe and the sample chamber. The mainframe houses all the components of the system and is responsible for the overall control and operation of the system. The sample chamber is where the wafer is placed. The chamber is equipped with an integrated filtration system to remove contaminants and clean the chamber before and after each application. The wafer is placed in the sample chamber and the cleaning solution is injected into the chamber. The chamber is then sealed and the device is set into operation. The device uses pressure to clean the wafer surface and remove dirt. The wafer is then subjected to deglazing or other processes depending on the application. The substrate is then rinsed and dried, and the surface is ready for further processing. The KPT45521-410 includes several built-in safety features. These include an air flow monitor to ensure the proper ventilation of the sample chamber, a pressure check valve to ensure the safety of the substrate, and a sensor monitoring the operation of the system. The KPT45521-410 is a powerful tool for wafer cleaning and surface conditioning. The device is specifically designed to meet the needs of the back-end of line (BEOL) processing industry, providing high performance and reliability. The device can execute a wide variety of application-based processes, ensuring a high level of quality and uniformity of the substrate’s surface. In addition, the device is equipped with several safety features, enabling users to work with confidence.The specific data is subject to PDF, and the above content is for reference
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