4694RBUHD3 B50

Due to market price fluctuations, if you need to purchase or consult the price. You can contact us or emial to us:   sales@allicdata.com

The keyword 4694RBUHD3 B50 refers to a type of box-shaped, dual-ported diffusion pump. These kinds of diffusion pumps are generally employed in several processes, including vacuum evaporation, film deposition, photolithography, vacuum degassing, and nano-component manufacturing. All diffusion pumps perform the same functions, but their designs vary based on the processes that they are designed to support. In particular, the 4694RBUHD3 B50 diffusion pump is specifically used in many applications, making this particular type of pump a preferred option among many professionals in the industry.

The 4694RBUHD3 B50 diffusion pump is considered as a high-performing, dual-ported diffusion pump. It is designed to provide high vacuum performance and long life, offering a number of experts a dependable, reliable, and efficient option when it comes to vacuum evaporation, film deposition, photolithography, vacuum degassing, and nanotechnology processes. Meanwhile, it also features a low thermal load, helping to reduce the risk of contamination.

The working principle of the 4694RBUHD3 B50 diffusion pump is relatively simple. The pump uses a vacuum created by compressing a filter material, which is sealed within the pump\'s box. The air then passes through a pre-heater, which heats the air and raises its pressure. From there, the heated air passes through the cooling section, which then condenses the gases and allows them to be exhausted from the exhaust port. The suction capacity of this diffusion pump is such that it can create vacuums ranging from atmospheric to up to 6-7 Torr.

When it comes to application RHD3 B50 diffusion pump, it can be used to perform different processes such as vacuum evaporation, film deposition, photolithography, vacuum degassing, and nanotechnology processes. In particular, it is preferred when it comes to film deposition processes, wherein the vacuum created by the pump helps to efficiently evaporate a metal or other material onto a substrate material for film formation. The pump is also used in photolithography processes in order to ensure that the layer of photoresist that is applied to the substrate is completely level and has no trapped air. Additionally, the vacuum created by the pump is also essential for removing unwanted particles, such as air bubbles, when it comes to degassing processes, as well as when creating sub-micron structures in nanotechnology processes.

The 4694RBUHD3 B50 diffusion pump is an effective and efficient solution for many industrial processes. Its strong suction power ensures that it can create higher thresholds of vacuum and lower contamination risks. Furthermore, its robust build and low thermal load ensure that it can operate dependably and reliably for many applications. Ultimately, this type of diffusion pump is an ideal option for many professionals in the industry.

The specific data is subject to PDF, and the above content is for reference