H21UM Allicdata Electronics
Allicdata Part #:

H21UM-ND

Manufacturer Part#:

H21UM

Price: $ 16.23
Product Category:

Uncategorized

Manufacturer: Altech Corporation
Short Description: AUXILIARY SWITCH 2 NO1 NC CONTAC
More Detail: N/A
DataSheet: H21UM datasheetH21UM Datasheet/PDF
Quantity: 1000
1 +: $ 14.75460
Stock 1000Can Ship Immediately
$ 16.23
Specifications
Series: *
Part Status: Active
Description

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Hyperthermal atomic and molecular ion beams, frequently referred to as H21UM, are particle beams consisting of energetic ions. These ion beams can be used for many applications, such as desorption, ion etching, sputtering, and ion implantation. In this article, we will discuss the application fields and working principle of H21UM.

Applications of H21UM

H21UM has a wide range of applications in physics, materials science, chemistry and engineering. It is used in the fields of neutralization of charged particles, separation of isotopes, surface erosion and sputtering, surface modifications, ion implantation, molecular etching, and surface characterizations. H21UM also finds applications in the fabrication of semiconductor devices, optical coatings, and nanomaterials. Due to its high accuracy and precision, H21UM is also used in electron microscopy, X-ray crystallography, and nuclear physics.

Working Principle of H21UM

H21UM works by generating a high intensity, mass-selected, ion beam. The mass is selected by a quadrupole mass filter which separates ions of different mass-to-charge ratios. The ions are then accelerated to a high velocity by a pulsed electric field. The beam is focused and concentrated by electrostatic lenses or electromagnetic fields. The ion beam is then steered by magnets towards a specified target area. The ion beam is also used to bombard a substrate or target material to produce ions of different mass-to-charge ratios.

The ion beam can also be used to deposit a thin film of a material onto a target for surface modifications. This process is called ion beam sputtering. In this process, the ions from the ion beam are accelerated towards the target material, which sputters or ablates a few atoms from the surface. This material is then deposited on the target surface. The ion beam can also be directed to bombard a material for ion implantation. In this process, the ions from the beam are implanted into the target material, which helps modify the properties of the material.

In addition, H21UM can also be used for analysing samples in surface chemical analysis. A sample surface is bombarded with the ions from the beam at different angles and the ejected material is collected in a detector. This data is then analysed to determine the chemical composition and the concentration of elements in the sample. This technique is called ion scattering spectroscopy.

Conclusion

H21UM is a powerful tool that can be used for a wide variety of applications in physics, materials science, chemistry, and engineering. It works by generating a high intensity, mass-selected, ion beam which is then steered and focused. The ion beam can then be used to bombard substrates and target materials for desorption, etching, sputtering, or implantation. It can also be used for surface modifications, electron microscopy, X-ray crystallography, and nuclear physics. H21UM is an invaluable tool for research and development.

The specific data is subject to PDF, and the above content is for reference

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