Allicdata Part #: | 497-16348-5-ND |
Manufacturer Part#: |
STP28N60DM2 |
Price: | $ 0.00 |
Product Category: | Discrete Semiconductor Products |
Manufacturer: | STMicroelectronics |
Short Description: | MOSFET N-CH 600V 21A |
More Detail: | N-Channel 600V 21A (Tc) 170W (Tc) Through Hole TO-... |
DataSheet: | STP28N60DM2 Datasheet/PDF |
Quantity: | 38 |
Vgs(th) (Max) @ Id: | 5V @ 250µA |
Package / Case: | TO-220-3 |
Supplier Device Package: | TO-220 |
Mounting Type: | Through Hole |
Operating Temperature: | -55°C ~ 150°C (TJ) |
Power Dissipation (Max): | 170W (Tc) |
FET Feature: | -- |
Input Capacitance (Ciss) (Max) @ Vds: | 1500pF @ 100V |
Vgs (Max): | ±25V |
Gate Charge (Qg) (Max) @ Vgs: | 34nC @ 10V |
Series: | MDmesh™ DM2 |
Rds On (Max) @ Id, Vgs: | 160 mOhm @ 10.5A, 10V |
Drive Voltage (Max Rds On, Min Rds On): | 10V |
Current - Continuous Drain (Id) @ 25°C: | 21A (Tc) |
Drain to Source Voltage (Vdss): | 600V |
Technology: | MOSFET (Metal Oxide) |
FET Type: | N-Channel |
Part Status: | Active |
Packaging: | Tube |
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:STP28N60DM2 is a MOSFET type transistor with a single cell, which is suitable for various industrial applications. Its working is based on a MOSFET, which is a field-effect transistor (FET) with metal–oxide–semiconductor (MOS) technology. It was first developed by MOSFET inventor Mohamed M. Atalla and Dawon Kahngat Bell Laboratories in 1959. It has a fast switching speed and maintains high performance with low power consumption.
The STP28N60DM2 is mainly used in harsh, high-temperature industrial video application and can work both in forward and reverse direction. It is fabricated using a high voltage process, which reduces its on-state resistance and increases its efficiency. It has exceptional stability and reliability, also making it suitable for heavy-duty applications and applications with extreme temperature ranges. Additionally, it has a high breakdown voltage, ensuring the safe operation of a system.
The operating principle of the STP28N60DM2 is similar to the principle of other MOSFETs. It comprises of a metal–oxide–semiconductor gate and a source–drain path. The metal–oxide–semiconductor gate has three parts: the gate oxide, the gate metal and the gate region. The source–drain path has two sections, the source and the drain. The transistor has a number of regions: the depletion zone, the enhancement zone, and the punch-through zone.
When a voltage is applied to the gate, it creates an electric field that exerts an attractive force on the electrons and repels them away from the gate. This controls the flow of electrons between the source and the drain, enabling the transistor to switch on or off. The depletion zone, the enhancement zone, and the punch-through zone help to control this electron flow.
In the depletion zone, the electrons are repulsed and they cannot flow between the source and the drain. In the enhancement zone, the electrons are attracted and they will flow between the source and the drain. In the punch-through zone, both repelling and attracting forces are active and the electrons will flow. This process enables the STP28N60DM2 to switch on and off and can be used to control a current flow in the device.
The STP28N60DM2 is suitable for applications where high frequency operation is required such as power conversion, motor control, bi-directional load switching, etc. It is also ideal for industrial video applications that require high reliability and stability. This makes it suitable for a range of industrial applications.
The specific data is subject to PDF, and the above content is for reference
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