Allicdata Part #: | BF2030WH6814XTSA1TR-ND |
Manufacturer Part#: |
BF2030WH6814XTSA1 |
Price: | $ 0.00 |
Product Category: | Discrete Semiconductor Products |
Manufacturer: | Infineon Technologies |
Short Description: | MOSFET N-CH 8V 40MA SOT343 |
More Detail: | RF Mosfet N-Channel 5V 10mA 800MHz 23dB PG-SOT343... |
DataSheet: | BF2030WH6814XTSA1 Datasheet/PDF |
Quantity: | 1000 |
1 +: | 0.00000 |
Noise Figure: | 1.5dB |
Current - Test: | 10mA |
Power - Output: | -- |
Voltage - Rated: | 8V |
Package / Case: | SC-82A, SOT-343 |
Supplier Device Package: | PG-SOT343-4 |
Base Part Number: | BF2030 |
Series: | -- |
Packaging: | Tape & Reel (TR) |
Part Status: | Obsolete |
Transistor Type: | N-Channel |
Frequency: | 800MHz |
Gain: | 23dB |
Voltage - Test: | 5V |
Current Rating: | 40mA |
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BF2030WH6814XTSA1 is a type of radio frequency (RF) metal–oxide–semiconductor field-effect transistor (MOSFET) device. This type of MOSFET is commonly used for RF amplifiers, RF switches, and other RF applications such as radar and satellite communications. This type of MOSFET has various features such as low gate input capacitance, low drain source capacitance, low gate-drain capacitance, and high voltage operation.
Application Field
BF2030WH6814XTSA1 MOSFETs are widely used in various RF applications, such as RF amplifier, RF switches, and RF protection devices. They are particularly suitable for applications in which the gate capacitance topology needs to remain low, such as low noise amplifiers, high frequency oscillators, applications such as switch-mode power supplies. Furthermore, they are also used in microwave and wireless communication systems, radar, and satellite communication.
Working Principle
The working principle of the BF2030WH6814XTSA1 MOSFET is based on the MOSFET structure, which consists of four layers: the source, gate, drain, and substrate. The source and drain regions are doped with n-type material. The gate region is typically made from polysilicon and metal layers. A gate oxide layer is also created to insulate the metal layer from the substrate.
When voltage is applied to the gate, current flows between the source and drain regions as a result of a MOSFET action in which electrons are attracted to the area of lower charge. In this way, the gate voltage controls the current between the source and drain. In addition, the device is also characterized by low gate input capacitance, low drain source capacitance, low gate-drain capacitance, and high voltage operations.
The specific data is subject to PDF, and the above content is for reference
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