FCA20N60-F109 Allicdata Electronics
Allicdata Part #:

FCA20N60-F109-ND

Manufacturer Part#:

FCA20N60-F109

Price: $ 1.97
Product Category:

Discrete Semiconductor Products

Manufacturer: ON Semiconductor
Short Description: MOSFET N-CH 600V 20A TO-3P
More Detail: N-Channel 600V 20A (Tc) 208W (Tc) Through Hole TO-...
DataSheet: FCA20N60-F109 datasheetFCA20N60-F109 Datasheet/PDF
Quantity: 1000
450 +: $ 1.77807
Stock 1000Can Ship Immediately
$ 1.97
Specifications
Gate Charge (Qg) (Max) @ Vgs: 98nC @ 10V
Base Part Number: FCA20N60
Package / Case: TO-3P-3, SC-65-3
Supplier Device Package: TO-3PN
Mounting Type: Through Hole
Operating Temperature: -55°C ~ 150°C (TJ)
Power Dissipation (Max): 208W (Tc)
FET Feature: --
Input Capacitance (Ciss) (Max) @ Vds: 3080pF @ 25V
Vgs (Max): ±30V
Series: SuperFET™
Vgs(th) (Max) @ Id: 5V @ 250µA
Rds On (Max) @ Id, Vgs: 190 mOhm @ 10A, 10V
Drive Voltage (Max Rds On, Min Rds On): 10V
Current - Continuous Drain (Id) @ 25°C: 20A (Tc)
Drain to Source Voltage (Vdss): 600V
Technology: MOSFET (Metal Oxide)
FET Type: N-Channel
Part Status: Not For New Designs
Packaging: Tube 
Description

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The FCA20N60-F109 is part of the FET family and is a single, insulated gate MOSFET (Metal Oxide Semiconductor Field Effect Transistor). Its main purpose is to act as a digital non-emitting switch. The FCA20N60-F109 takes only a small amount of electrical power to switch it on and off so that it can conserve energy when it is not needed.

The FCA20N60-F109 is made up of a semiconductor silicon chip and its construction is similar to a normal MOSFET, but with a few extra components. At the heart of the chip is the metal oxide layer, which acts as a barrier between the source and drain, keeping the current from leaking through to the substrate. This layer is also used to control the voltage applied to the drain and source.

The FCA20N60-F109 is just one of many applications for metal oxide semiconductor field effect transistors. The transistor is typically used in low-power circuits where the power dissipation needs to be minimized, such as those for audio amplifiers, generators, inverters, and power supplies. It is also used in computer chips and other digital devices.

The working principle behind the FCA20N60-F109 is relatively simple. When the gate voltage is applied, a metal oxide layer forms between the source and drain of the transistor. This layer acts as a small capacitor, preventing the current from passing through the substrate.

By adjusting the gate voltage, the metal oxide layer can be made to act as a diode, allowing the current to flow through the source and drain. If the gate voltage is too low, the current will not be able to flow through the source and drain, resulting in a failed switching action.

To make the FCA20N60-F109 work even more efficiently, the metal oxide layer is given a negatively charged dopant. This lightly charges the metal oxide layer so that only a small amount of electricity is required to switch it on and off.

In summary, the FCA20N60-F109 is a single, insulated gate metal oxide semiconductor field effect transistor that is used in low-power circuits where power efficiency needs to be maximized. It works by adjusting the gate voltage to create a metal oxide layer between the source and drain, which acts as a small capacitor. When the metal oxide layer is given a negative charge, a minimal amount of electricity is required to switch the transistor on and off.

The specific data is subject to PDF, and the above content is for reference

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