Allicdata Part #: | VRF141G-ND |
Manufacturer Part#: |
VRF141G |
Price: | $ 77.76 |
Product Category: | Discrete Semiconductor Products |
Manufacturer: | Microsemi Corporation |
Short Description: | RF PWR MOSFET 80V 40A DIE |
More Detail: | RF Mosfet N-Channel 28V 500mA 175MHz 14dB 300W |
DataSheet: | VRF141G Datasheet/PDF |
Quantity: | 1000 |
10 +: | $ 70.69230 |
Series: | -- |
Packaging: | Bulk |
Part Status: | Active |
Transistor Type: | N-Channel |
Frequency: | 175MHz |
Gain: | 14dB |
Voltage - Test: | 28V |
Current Rating: | 40A |
Noise Figure: | -- |
Current - Test: | 500mA |
Power - Output: | 300W |
Voltage - Rated: | 80V |
Package / Case: | SOT-540A |
Supplier Device Package: | -- |
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One of the biggest changes in the RF semiconductor industry recently has been the introduction of the VRF141G field effect transistor. This small device offers a number of advantages particularly when compared with other devices of a similar specification, such as its low noise performance, low voltage drop and higher power handling capability. As more and more devices of this type enter into the market, it is important to understand the key application fields and working principles of this transistor.
The key application fields for the VRF141G Field Effect Transistor (FET) are in the areas of Wi-Fi (Wireless Local Area Network) and Bluetooth communication, broadcast applications and a range of other industry standard applications. The FET offers a number of advantages when compared with other FETs, such as its low gate leakage current, high power efficiency and, of course, its higher power handling capability. In addition, it is able to operate at a wide range of temperatures, up to +125°C, making it proficient for applications which require a high thermal resistance.
At its most basic, the VRF141G is a metal-oxide-silicon field-effect transistor for low frequency, high-gain applications. It is a single-gate, insulated-gate bipolar transistor (IGBT), which relies on a thin layer of silicon, known as the gate oxide, to trap or release electrons, or, in simpler terms, create either a high or low resistance in the device. The electrons that get trapped in the oxide layer have their movements restricted to a few nanometers, causing their resistance to be very low. Consequently, the amplified signal received through the motion of the electron will be stronger as it passes through.
The FET requires a minimal amount of bias voltage to operate, and it is also relatively stable in terms of offsets and temperature behavior. Furthermore, it is able to achieve gains of up to 20dB, making it very well suited to high gain applications. For example, a single FET can be used to provide the required gain for a wireless radio frequency (RF) system, such as Bluetooth or Wi-Fi.
The VRF141G FET is also increasingly being used in high-definition TV (HDTV) applications due to its strong power handling capabilities and its wider frequency range. This allows the device to be used to amplify signals from both analog and digital television sources. The higher power handling capability also allows for longer transmission distances, as the amplifier does not have to work as hard to keep the signal clear at longer distances.
In summary, the VRF141G field effect transistor is an ideal choice for a range of high frequency and high-gain applications, such as Wi-Fi, Bluetooth, HDTV, or any other application which requires a high power handling capability. The low gate leakage current and its ability low power loss makes the VRF141G a perfect choice for these requirements.
The specific data is subject to PDF, and the above content is for reference
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