2N6800U Allicdata Electronics
Allicdata Part #:

2N6800U-ND

Manufacturer Part#:

2N6800U

Price: $ 0.00
Product Category:

Discrete Semiconductor Products

Manufacturer: Microsemi Corporation
Short Description: MOSFET N-CH 400V 18LCC
More Detail: N-Channel 400V 3A (Tc) 800mW (Ta), 25W (Tc) Surfac...
DataSheet: 2N6800U datasheet2N6800U Datasheet/PDF
Quantity: 1000
1 +: 0.00000
Stock 1000Can Ship Immediately
$ 0
Specifications
Vgs(th) (Max) @ Id: 4V @ 250µA
Package / Case: 18-CLCC
Supplier Device Package: 18-ULCC (9.14x7.49)
Mounting Type: Surface Mount
Operating Temperature: -55°C ~ 150°C (TJ)
Power Dissipation (Max): 800mW (Ta), 25W (Tc)
FET Feature: --
Vgs (Max): ±20V
Gate Charge (Qg) (Max) @ Vgs: 5.75nC @ 10V
Series: --
Rds On (Max) @ Id, Vgs: 1 Ohm @ 2A, 10V
Drive Voltage (Max Rds On, Min Rds On): 10V
Current - Continuous Drain (Id) @ 25°C: 3A (Tc)
Drain to Source Voltage (Vdss): 400V
Technology: MOSFET (Metal Oxide)
FET Type: N-Channel
Part Status: Obsolete
Packaging: Bulk 
Description

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The 2N6800U is a three-terminal N-channel depletion-mode MOSFET whose drain current and drain-to-source voltage (VDS) is controlled by the gate-to-source voltage (VGS). It is a versatile, robust and reliable device designed for low-power switching and linear amplification applications. It is suitable for both digital and analog applications.

Applications of the 2N6800U are varied, ranging from switching circuits and power amplifiers to digital logic and linear applications. As an N-channel device, it is capable of switching higher loads relative to P-channel devices. This makes it particularly useful in low-level driving applications, such as in signal transmission, control, and interfacing. It can also be used as a power amplifier for signal amplification and filtering.

The working principle of the 2N6800U device is based on a depletion-mode MOSFET (MOFSET) device, which is composed of a thin-film layer of metal gate oxide, a gate region, and a source and drain. The thin-film layer of metal gate oxide serves as an insulating layer, preventing current from flowing through the device. This is known as the Gate Oxide Effect.

The gate region is the active region of the device, where the MOSFET can be configured to operate as either an N-channel or P-channel device. In the N-channel configuration, the gate voltage is controlled by the gate-to-source voltage (VGS). The current that flows through the device is affected by the magnitude of the VGS. By setting the VGS to the right value, the current is gated, allowing the user to control the amount of current flowing through the device.

In the P-channel configuration, the drain-to-source voltage (VDS) is controlled by a positive gate voltage. By adjusting this voltage, the current can be gated, allowing for switching and amplification applications. The device also features intrinsic drain-to-source protection, with a built-in clamping diode that protects the device from overvoltage.

The 2N6800U is the perfect choice for low-power switching and linear amplification applications. It is designed with a lower power dissipation than other comparable MOSFET devices. Its robust and reliable design make it suitable for both digital and analog applications, allowing for flexibility and versatility. The 2N6800U\'s working principle and application field are a testament to its quality as a device.

The specific data is subject to PDF, and the above content is for reference

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