A2I25H060NR1 Allicdata Electronics
Allicdata Part #:

A2I25H060NR1-ND

Manufacturer Part#:

A2I25H060NR1

Price: $ 41.66
Product Category:

Discrete Semiconductor Products

Manufacturer: NXP USA Inc
Short Description: IC RF LDMOS AMP
More Detail: RF Mosfet LDMOS (Dual) 28V 26mA 2.59GHz 26.1dB 10....
DataSheet: A2I25H060NR1 datasheetA2I25H060NR1 Datasheet/PDF
Quantity: 1000
500 +: $ 37.86930
Stock 1000Can Ship Immediately
$ 41.66
Specifications
Series: --
Packaging: Tape & Reel (TR) 
Part Status: Active
Transistor Type: LDMOS (Dual)
Frequency: 2.59GHz
Gain: 26.1dB
Voltage - Test: 28V
Current Rating: --
Noise Figure: --
Current - Test: 26mA
Power - Output: 10.5W
Voltage - Rated: 65V
Package / Case: TO-270-17 Variant, Flat Leads
Supplier Device Package: TO-270WB-17
Description

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A2I25H060NR1 application field and working principle

A2I25H060NR1 is an RF metal oxide semiconductor field effect transistor (MOSFET) that is widely used in analog and digital circuits for the purpose of controlling inputs and outputs. It is part of a larger family of metal oxide semiconductor field effect transistors, and is ideal for use in applications that require high input impedance, low on-resistance, as well as fast switching with low energy consumption. The device has a large gain and very low quiescent current drain, making it ideal for use in battery-powered systems.

A2I25H060NR1 MOSFETs are usually used in wireless communications, light-sensitive sensors, and industrial sensor systems, among other applications. The device can also be used to control switching of inductors and capacitors, allowing it to function as a variable amount of energy absorber in multiple power systems. Additionally, its low on-resistance makes it useful for controllable current sources and constant-current elements.

The basic working principle behind A2I25H060NR1 is based on the Gate Effect. When a voltage (Vg) is applied to the Gate, the resistance between Source and Drain terminals increases or decreases (by controlled capacitance), depending on the voltage applied. This phenomenon is known as the Gate Effect, which is the basis of MOSFET technology. A2I25H060NR1 consists of a stainless steel gate with a Polycrystalline Silicon (poly silicon) layer, a silicon dioxide insulation layer, and metal silicate layers (MSL) on the top and bottom of the Gates. The dimensions of the gates and how they are placed can also be adjusted and varied to alter the characteristics of the device, including the gate oxide thickness, gate oxide width, gate oxide film quality, and so on.

The A2I25H060NR1 is capable of switching at high speed, with low power consumption and noiseless operation. Additionally, its low on-resistance and high input impedance facilitate a faster switch turn-on and off times, allowing it to be used in applications requiring high precision and accuracy. The device also features an integrated low leakage current, making it very suitable for use in ultra-low power applications. It is also capable of suppressing malformed signals and reducing electromagnetic interference in RF applications.

In summary, the A2I25H060NR1 MOSFET is an ideal choice for RF applications due to its low on-resistance, high gain, fast switching speed, and noiseless operation. Additionally, its low power consumption makes it ideal for use in battery-powered systems, light-sensitive sensors, and other low-power devices. The device also features an integrated low leakage current, making it very suitable for use in ultra-low power applications.

The specific data is subject to PDF, and the above content is for reference

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