MGSF1N03LT1G Discrete Semiconductor Products |
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Allicdata Part #: | MGSF1N03LT1GOSTR-ND |
Manufacturer Part#: |
MGSF1N03LT1G |
Price: | $ 0.11 |
Product Category: | Discrete Semiconductor Products |
Manufacturer: | ON Semiconductor |
Short Description: | MOSFET N-CH 30V 1.6A SOT-23 |
More Detail: | N-Channel 30V 1.6A (Ta) 420mW (Ta) Surface Mount S... |
DataSheet: | MGSF1N03LT1G Datasheet/PDF |
Quantity: | 32000 |
3000 +: | $ 0.09468 |
Specifications
Vgs(th) (Max) @ Id: | 2.4V @ 250µA |
Package / Case: | TO-236-3, SC-59, SOT-23-3 |
Supplier Device Package: | SOT-23-3 (TO-236) |
Mounting Type: | Surface Mount |
Operating Temperature: | -55°C ~ 150°C (TJ) |
Power Dissipation (Max): | 420mW (Ta) |
FET Feature: | -- |
Input Capacitance (Ciss) (Max) @ Vds: | 140pF @ 5V |
Vgs (Max): | ±20V |
Series: | -- |
Rds On (Max) @ Id, Vgs: | 100 mOhm @ 1.2A, 10V |
Drive Voltage (Max Rds On, Min Rds On): | 4.5V, 10V |
Current - Continuous Drain (Id) @ 25°C: | 1.6A (Ta) |
Drain to Source Voltage (Vdss): | 30V |
Technology: | MOSFET (Metal Oxide) |
FET Type: | N-Channel |
Part Status: | Active |
Packaging: | Tape & Reel (TR) |
Description
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The Application Field and Working Principle of MGSF1N03LT1G
Introduction
This article will discuss the application field and working principle of the MGSF1N03LT1G FET (Field-Effect Transistor), a modern, high-performance dual-gate device that is used in a wide range of applications. We will present the device’s background, construction, application fields, and working principle, as well as discuss potential issues related to its use.Background
The MGSF1N03LT1G is a field-effect transistor (FET), a type of active electronic device whose output is directly controlled by changing the strength of an electric field applied to its gate. Developed during the 1940s, FETs have grown increasingly popular due to their low power consumption, high input impedance, and fast switching speed. In particular, the MGSF1N03LT1G has a low maximum on-resistance (Rds (on)) and low gate-to-source voltage (Vgs) requirements; these properties, together with the device\'s high drain-source voltage (Vds) rating and its small physical size, make it suitable for a wide range of applications.Construction
The MGSF1N03LT1G is a dual-gate FET with a thin-film gate oxide branch. This branch allows two gate connections (or terminals), allowing both gate control and drain terminals to be connected to the same substrate. The device is built on an electrically-insulating substrate to provide insulation between the gate and the drain-source elements of the internal circuit; this also allows a small air gap to remain between adjacent transistors and prevents cross-talk between transistors. In terms of physical size, the MGSF1N03LT1G measures in at 2.5mm x 2.5mm x 0.5mm (W x L x H). It has a low on-resistance of 8.5 mΩ for a Vds of 10V, and a maximum Vgs of 20V.Application Fields
The MGSF1N03LT1G is suitable for a wide range of applications. It is primarily used in circuitry that requires fast switching speeds and low power consumption, such as in power management applications and field-programmable gate arrays (FPGAs). It can also be used in switch-mode power supplies and applications that require high-input impedance. Additionally, due to its low Rds (on) and fast switching speeds, the MGSF1N03LT1G is also used in digital circuits to provide high-current isolation.Working Principle
The MGSF1N03LT1G is a dual-gate FET device that uses the field-effect technology to control the flow of electrons between the drain and source terminals. When a positive voltage is applied to the gate terminals, the charge carriers in the drain and source terminals are attracted to the corresponding end of the gate wafer. This creates a conducting path between the source and drain terminals, allowing current to flow. This process is also referred to as electron-channel modulation. The MGSF1N03LT1G utilizes an additional gate oxide branch which is responsible for providing the two separate gate connections. This allows for the use of dual-gate devices, which operate with higher speeds and have lower power requirements than single-gate devices.Potential Issues
As with all electronic devices, the MGSF1N03LT1G has certain potential issues that users should be aware of. In particular, care must be taken to ensure that the device does not exceed its maximum voltages and currents. Additionally, it is important to make sure that the gate-ward potential is maintained low in order to avoid any risk of drain-source breakdown. Care must also be taken to ensure that the gate oxide is not damaged during handling and installation.Conclusion
The MGSF1N03LT1G FET is a modern, high-performance dual-gate device that is suitable for a wide range of applications. Its low power consumption and high input impedance make it ideal for use in power management applications and FPGAs, as well as switch-mode power supplies and digital circuits. The device also utilizes an additional gate oxide branch, allowing for the use of dual-gate devices, which operate with higher speeds and have lower power requirements than single-gate devices. Care must be taken to ensure that the device does not exceed its maximum voltages and currents, and that the gate oxide is not damaged during installation.The specific data is subject to PDF, and the above content is for reference
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