NTR1P02LT3G Discrete Semiconductor Products |
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Allicdata Part #: | NTR1P02LT3GOSTR-ND |
Manufacturer Part#: |
NTR1P02LT3G |
Price: | $ 0.00 |
Product Category: | Discrete Semiconductor Products |
Manufacturer: | ON Semiconductor |
Short Description: | MOSFET P-CH 20V 1.3A SOT23-3 |
More Detail: | P-Channel 20V 1.3A (Ta) 400mW (Ta) Surface Mount S... |
DataSheet: | NTR1P02LT3G Datasheet/PDF |
Quantity: | 1000 |
Vgs(th) (Max) @ Id: | 1.25V @ 250µA |
Package / Case: | TO-236-3, SC-59, SOT-23-3 |
Supplier Device Package: | SOT-23-3 (TO-236) |
Mounting Type: | Surface Mount |
Operating Temperature: | -55°C ~ 150°C (TJ) |
Power Dissipation (Max): | 400mW (Ta) |
FET Feature: | -- |
Input Capacitance (Ciss) (Max) @ Vds: | 225pF @ 5V |
Vgs (Max): | ±12V |
Gate Charge (Qg) (Max) @ Vgs: | 5.5nC @ 4V |
Series: | -- |
Rds On (Max) @ Id, Vgs: | 220 mOhm @ 750mA, 4.5V |
Drive Voltage (Max Rds On, Min Rds On): | 2.5V, 4.5V |
Current - Continuous Drain (Id) @ 25°C: | 1.3A (Ta) |
Drain to Source Voltage (Vdss): | 20V |
Technology: | MOSFET (Metal Oxide) |
FET Type: | P-Channel |
Part Status: | Active |
Packaging: | Tape & Reel (TR) |
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NTR1P02LT3G is a depletion-mode MOSFET (Metal Oxide Semiconductor Field Effect Transistor) operating in the junction field-effect range. It has a structure composed of metal, gate oxide, semiconductor substrate, and gate electrodes. The metal layer is electrically insulated from the gate oxide and source-gate electrodes, making it compatible with a wide range of voltage and current applications.
NTR1P02LT3G is mainly used in switching applications, where the gate electrode is driven low to turn off the device. It also finds many applicationswhere the gate electrode is used to control the current flow through the device.
The operating principle of NTR1P02LT3G can be easily understood. Under normal operating conditions, the applied gate voltage is insufficient to induce significant field-effect. The source-gate and drain-substrate junction field-effect transistors form a depletion region across the semiconductor substrate, which reduces the electric field across the semiconductor.
The NTR1P02LT3G device is a unipolar device, meaning it can be operated in either the n- or p-mode. In the n-mode the gate voltage is applied in the positive direction and the electrons flow from the drain to the source. In the p-mode, the gate voltage is applied in the negative direction and the holes flow from the source to the drain. The gate voltage controls the width of the depletion layer, which affects the electric current passing through the MOSFET.
When the gate voltage is increased above the threshold voltage, a gate-source voltage is formed and covalent bonds between the gate and source electrodes activate. This increases the width of the depletion region, which reduces the electric field across the semiconductor and effectively decreases the current passing through the transistor. This allows the device to be used as a switch.
NTR1P02LT3G is also used in amplifying applications. The gate current will cause a difference in the threshold voltage across the various gates. This increases the transconductance of the device and allows for amplification.
NTR1P02LT3G has many applications in the electronics industry. It can be used as a switch in many circuits, such as logic gates and memory cells. It has also found applications in computer graphics cards, communications systems, and instrumentation circuits. Its low power consumption and fast switching time makes it an ideal choice for many applications.
The specific data is subject to PDF, and the above content is for reference
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