FDN361AN Allicdata Electronics
Allicdata Part #:

FDN361AN-ND

Manufacturer Part#:

FDN361AN

Price: $ 0.00
Product Category:

Discrete Semiconductor Products

Manufacturer: ON Semiconductor
Short Description: MOSFET N-CH 30V 1.8A SSOT-3
More Detail: N-Channel 30V 1.8A (Ta) 500mW (Ta) Surface Mount S...
DataSheet: FDN361AN datasheetFDN361AN Datasheet/PDF
Quantity: 1000
Stock 1000Can Ship Immediately
Specifications
Vgs(th) (Max) @ Id: 3V @ 250µA
Package / Case: TO-236-3, SC-59, SOT-23-3
Supplier Device Package: SuperSOT-3
Mounting Type: Surface Mount
Operating Temperature: -55°C ~ 150°C (TJ)
Power Dissipation (Max): 500mW (Ta)
FET Feature: --
Input Capacitance (Ciss) (Max) @ Vds: 220pF @ 15V
Vgs (Max): ±20V
Gate Charge (Qg) (Max) @ Vgs: 4nC @ 5V
Series: PowerTrench®
Rds On (Max) @ Id, Vgs: 100 mOhm @ 1.8A, 10V
Drive Voltage (Max Rds On, Min Rds On): 4.5V, 10V
Current - Continuous Drain (Id) @ 25°C: 1.8A (Ta)
Drain to Source Voltage (Vdss): 30V
Technology: MOSFET (Metal Oxide)
FET Type: N-Channel
Part Status: Obsolete
Packaging: Tape & Reel (TR) 
Description

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A FDN361AN is a type of Field Effect Transistor (FET). Specifically, it is an enhancement-mode dual N-channel MOSFET (NMOSFET). It has an on-state resistance of between 0.7 to 1.2 ohms and a gate-source breakdown voltage of 95V. It is commonly used for high current and high power applications such as power management, audio power amplifiers, and solar cell rectification.

The gate of a FDN361AN is an insulated-gate field effect transistor. It is a three-terminal device composed of a gate (G), drain (D) and source (S). It is constructed on an insulated substrate to create the artificial potential barrier (Field Effect Region or FER) between the gate and the drain. The application of a small positive voltage to the gate creates an electric field, which in turn modulates the conductivity of the device, allowing for the control of current flow between the source and the drain.

The advantage of using a MOSFET is that it has a very high input impedance and is therefore very efficient when used for current amplification. It also has low power dissipation when conducting and is therefore suitable for applications with low energy losses. Additionally, the gate to drain current is almost perfectly constant over a wide range of input voltages and the device does not suffer from hysteresis.

The FDN361AN is a junction FET with two N-channel regions in the same chip. This makes it ideal for applications in which two independent switches are required. For example, in power management applications, it can be used to control two voltage rails simultaneously. Its high output capacitance makes it suitable for switching applications that require high-speed switching.

The FDN361AN is a the so-called \'bulk\' type MOSFET. This means that it has an aluminium or silicon substrate over which the gate, drain, and source are formed. The substrate is connected to ground and provides a balancing effect in the transistor. This type of MOSFET has a higher capacity (compared to surface-mounted devices) and a better thermal behaviour. It is also more reliable and less susceptible to destruction even in extreme conditions.

The working principle of a FET is based on controlling the flow of electrons between the source and the drain. This phenomenon is called the electron field effect. N-Channel MOSFETs have a negative field effect and therefore become conductive when a positive voltage is applied to the gate terminal. P-Channel MOSFETs, on the other hand, become conductive when a negative voltage is applied.

In summary, the FDN361AN is a field effect transistor with two N-channel regions. It is suitable for high-power and high-current applications, as well as for applications requiring two independent switches. Its high output capacitance ensures that it is capable of switching applications with high-speed. Additionally, its bulk construction makes it reliable and better able to withstand extreme conditions.

The specific data is subject to PDF, and the above content is for reference

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