MRF6S19100HR3 Allicdata Electronics
Allicdata Part #:

MRF6S19100HR3-ND

Manufacturer Part#:

MRF6S19100HR3

Price: $ 0.00
Product Category:

Discrete Semiconductor Products

Manufacturer: NXP USA Inc
Short Description: FET RF 68V 1.99GHZ NI-780
More Detail: RF Mosfet LDMOS 28V 900mA 1.99GHz 16.1dB 22W NI-78...
DataSheet: MRF6S19100HR3 datasheetMRF6S19100HR3 Datasheet/PDF
Quantity: 1000
Stock 1000Can Ship Immediately
Specifications
Series: --
Packaging: Tape & Reel (TR) 
Part Status: Obsolete
Transistor Type: LDMOS
Frequency: 1.99GHz
Gain: 16.1dB
Voltage - Test: 28V
Current Rating: --
Noise Figure: --
Current - Test: 900mA
Power - Output: 22W
Voltage - Rated: 68V
Package / Case: NI-780
Supplier Device Package: NI-780
Base Part Number: MRF6S19100
Description

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The MRF6S19100HR3 is a silicon, depletion–mode, laterally–diffused metal oxide silicon field–effect transistor (LDMOS–FET) designed for use in the 1805–1880 MHz radio frequency (RF) ranges in cellular radio applications. Operating from a +28 VDC drain supply voltage, it is well suited for use in linear or Class A applications. This device is also well–suited for use in applications requiring high efficiency and linearity, such as digital television transmitters, point–to–point communication systems, and cellular radio base station amplifiers.

The MRF6S19100HR3 is a high–power device with excellent RF performance. Due to its 100 W output power, it is used in power amplifiers that require high output power. This device also offers a wide range of gate bias voltages and current that allows it to be used as a linear amplifier in linear applications. The device also offers high gain and low power consumption, making it suitable for a variety of high–power linear amplifier applications.

The operating mechanism of the MRF6S19100HR3 is based on the depletion–mode LDMOSFET structure. The LDMOSFET consists of a silicon layer that is heavily doped with an n–type dopant (for the n–channel device) and a metal oxide layer on top of it. The metal oxide layer is formed by oxidation of the silicon layer. Gate oxidants are insulated from the silicon layer with a thin silicon dioxide layer. When an electric field is applied to the gate, the field causes electrons to be attracted to the gate region and become negatively charged. This causes the gate to become negatively charged and thus turn on the FET.

The MRF6S19100HR3 is a silicon–based, depletion–mode LDMOSFET designed for use in the 1805–1880 MHz RF ranges. It is designed for high–power linear operation in cellular radio applications. The device is suitable for applications requiring high efficiency and linearity, such as digital television transmitters, point–to–point communication systems, and cellular radio base station amplifiers. The operating mechanism of the device is based on the depletion–mode LDMOSFET structure, which offers excellent RF performance and a wide range of gate bias voltages and currents. The device also offers high gain and low power consumption, making it suitable for a variety of high-power linear amplifier applications. For these reasons, the MRF6S19100HR3 is the ideal choice for a variety of RF applications.

The specific data is subject to PDF, and the above content is for reference

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