2SK122800L Allicdata Electronics

2SK122800L Discrete Semiconductor Products

Allicdata Part #:

2SK122800LTR-ND

Manufacturer Part#:

2SK122800L

Price: $ 0.00
Product Category:

Discrete Semiconductor Products

Manufacturer: Panasonic Electronic Components
Short Description: MOSFET N-CH 50V 50MA MINI 3-PIN
More Detail: N-Channel 50V 50mA (Ta) 150mW (Ta) Surface Mount M...
DataSheet: 2SK122800L datasheet2SK122800L Datasheet/PDF
Quantity: 1000
1 +: 0.00000
Stock 1000Can Ship Immediately
$ 0
Specifications
Vgs(th) (Max) @ Id: 1.1V @ 100µA
Package / Case: TO-236-3, SC-59, SOT-23-3
Supplier Device Package: Mini3-G1
Mounting Type: Surface Mount
Operating Temperature: 150°C (TJ)
Power Dissipation (Max): 150mW (Ta)
FET Feature: --
Input Capacitance (Ciss) (Max) @ Vds: 4.5pF @ 5V
Vgs (Max): 10V
Series: --
Rds On (Max) @ Id, Vgs: 50 Ohm @ 10mA, 2.5V
Drive Voltage (Max Rds On, Min Rds On): 2.5V
Current - Continuous Drain (Id) @ 25°C: 50mA (Ta)
Drain to Source Voltage (Vdss): 50V
Technology: MOSFET (Metal Oxide)
FET Type: N-Channel
Part Status: Obsolete
Packaging: Tape & Reel (TR) 
Description

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The 2SK122800L is an enhancement-mode laterally-diffused metal-oxide semiconductor field-effect transistor (LDMOSFET) with a single drain. It is designed to be used in applications in the RF communication market such as cellular base station power amplifiers. The 2SK122800L provides quality, dependability and reliability. This transistor provides excellent linearity, quick switch-on and low insertion loss.

The 2SK122800L LDMOSFET works using the principles of electric fields and capacitance. It employs a metallic gate (electrode) that forms a "channel" to the substrate when electric fields are applied to it. The electric fields control the conductivity of the underlying substrate by controlling the width of the "channel". When negative bias is applied to the gate, it creates a very thin depletion region and the body of the substrate is able to become conducting.

This LDMOSFET is designed to minimize power dissipation while providing good linearity and switching performance. The 2SK122800L consists of an enhancement-mode commonly-connected drain and two source terminals. Due to this structure, it provides an improved linearity over conventional FETs by creating an additional transistor. This helps to reduce distortion and improve switching performance.

In order to get the best performance from the 2SK122800L, it requires proper operation current, thermal and bias handling. It should be operated within the specified voltage and current ratings. The source terminal needs to be biased at a dynamic resistance (RDS(ON)) which is based on the device size and application. The drain voltage needs to be within the device\'s power dissipation rating, between the specified VDS (Drain-Source Voltage), ID (Continuous Drain Current) and the thermal limit.

The 2SK122800L is designed for use in a variety of RF communication applications, such as cellular base station power amplifiers, RF switches, RF Doppler Radar, RF imaging systems, and other applications that require linearity, quick switch-on and low insertion loss. It is also suitable for high-power Wi-Fi 2.4/5 GHz and LTE/WCDMA (3G/4G ) transceiver applications.

The 2SK122800L is a versatile and dependable LDMOSFET device. It is able to provide excellent linearity, quick switch-on and low insertion loss, making it an ideal choice for a variety of RF applications. With a well-designed power application design, the device can provide superior performance for the intended application.

The specific data is subject to PDF, and the above content is for reference

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