Allicdata Part #: | AFT26HW050GSR3-ND |
Manufacturer Part#: |
AFT26HW050GSR3 |
Price: | $ 0.00 |
Product Category: | Discrete Semiconductor Products |
Manufacturer: | NXP USA Inc |
Short Description: | FET RF 2CH 65V 2.69GHZ NI780-4 |
More Detail: | RF Mosfet LDMOS (Dual) 28V 100mA 2.69GHz 14.2dB 9W... |
DataSheet: | AFT26HW050GSR3 Datasheet/PDF |
Quantity: | 1000 |
Series: | -- |
Packaging: | Tape & Reel (TR) |
Part Status: | Last Time Buy |
Transistor Type: | LDMOS (Dual) |
Frequency: | 2.69GHz |
Gain: | 14.2dB |
Voltage - Test: | 28V |
Current Rating: | -- |
Noise Figure: | -- |
Current - Test: | 100mA |
Power - Output: | 9W |
Voltage - Rated: | 65V |
Package / Case: | NI-780GS |
Supplier Device Package: | NI-780GS |
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The AFT26HW050GSR3 is a gallium arsenide field-effect transistor (GaAs FET) designed specifically to optimize linearity performance in the radio frequency (RF) range. It is among the most commonly used transistors in this particular application field, providing reliable operation and top-grade performance. The AFT26HW050GSR3 is available in a dual-gate, hermetically sealed, surface-mountable package. In this article, we will look at the application field and working principle of this transistor.
Application Field of AFT26HW050GSR3
The AFT26HW050GSR3 is mainly used in radio-based applications. Its dual-gate design makes it ideal for cellular and related mobile communications, where it is used as a linear amplifier or mixer. It is also often used in Wi-Fi applications and is known for providing excellent linearity in this application field. Furthermore, the AFT26HW050GSR3 can be used in various other RF applications, such as radar systems and Global Positioning System (GPS) equipment.
Working Principle of AFT26HW050GSR3
The AFT26HW050GSR3 utilizes a type of FET called a Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET). The working principle of this type of transistor involves the use of an electric field to control the modulation of a current flow between two terminals, known as the source and the drain. An oxide layer between the source and drain regions acts as an insulator, preventing any current from flowing between them. A gate electrode is then applied in close proximity to the oxide layer. The resulting electric field set up by the gate voltage modulates the thickness of the oxide layer and allows current to flow between the source and drain. This allows the user to control the current and voltage flowing through the device.
The AFT26HW050GSR3 differs from other MOSFETs in that it is designed specifically to operate in the radio frequency (RF) range. This means that it has been optimized in order to provide improved linearity and superior performance than what would be expected from a standard MOSFET. The use of GaAs construction materials also makes the transistor more robust and better able to withstand RF radiation.
Conclusion
The AFT26HW050GSR3 is a type of GaAs field-effect transistor designed for use in the field of radio-based applications. It is optimized for high-frequency operation and provides excellent linearity and superior performance. Its dual-gate design makes it ideal for use in cellular, Wi-Fi and radar systems, among other applications. The transistor utilizes a MOSFET-like principle of operation, where a gate voltage is used to modulate the thickness of an oxide layer between the source and drain, allowing for voltage and current control.
The specific data is subject to PDF, and the above content is for reference
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