| Allicdata Part #: | HAT2200RWS-E-ND |
| Manufacturer Part#: |
HAT2200RWS-E |
| Price: | $ 0.00 |
| Product Category: | Uncategorized |
| Manufacturer: | Renesas Electronics America |
| Short Description: | IC MCU 16BIT |
| More Detail: | N/A |
| DataSheet: | HAT2200RWS-E Datasheet/PDF |
| Quantity: | 1000 |
| 1 +: | 0.00000 |
| Series: | * |
| Part Status: | Obsolete |
Due to market price fluctuations, if you need to purchase or consult the price. You can contact us or emial to us: sales@allicdata.com
The HAT2200RWS-E is a two-stage, liquid-cooled regenerative vacuum pump developed specifically for precision machining and lapping to replace traditional large rotary vacuum pumps. This pump is based on the unique rotating vane technology bearing the signature of Anderson & Forrister technology and is commanded by a PLC controller. This combination ensures the optimal performance of the vacuum pump and its perfect suitability for precision machining and lapping of high-end goods like watches, mobile devices, medical instruments, electronic components, semiconductors and more.
The HAT2200RWS-E has two stages, each with their own application fields and working principles. The first stage is the compression stage. This is where the pump\'s performance is focused primarily on removing air from the chamber. The compression stage works by using one set of vanes that are set at an angle to the rotors. This angle creates a centrifugal force, which causes the vanes to move outward and create a suction. This suction draws in the air from the chamber and compresses it into the chamber. Once the air is compressed, it is discharged from the exhaust port of the pump.
The second stage of the pump is the regeneration stage. This stage uses a set of vanes that are also set at an angle to the rotors, but with the opposite effect. The centrifugal force created by this angle causes the vanes to move inward and compress the air even further. This compression increases the pressure of the air, resulting in a greater amount of vacuum to be generated. The increased pressure allows for more efficient removal of air from the chamber, resulting in better performance and greater efficiency.
The HAT2200RWS-E has several key features that make it an excellent choice for precision machining and lapping. Firstly, the pump is highly efficient, achieving up to 98.5% CFM (cubic feet per minute) efficiency. Secondly, the pump has a unique swinging vane technology that allows for a smooth and balanced flow, resulting in low vibration and improved performance. This technology also reduces the noise generated by the pump, making it perfect for precision machining applications. Finally, the pump is equipped with a PLC controller that allows for precise and consistent speed and control.
The HAT2200RWS-E is an effective and efficient solution for precision machining and lapping applications. The combination of a two-stage liquid-cooling regenerative design, swinging vane technology, and a PLC controller make this pump an excellent choice for those who demand precision and reliability from their vacuum pump.
The specific data is subject to PDF, and the above content is for reference
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DIODE GENERAL PURPOSE TO220
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CA08COME36-3PB-44
CA-BAYONET
CB 6C 6#16S SKT PLUG
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HAT2200RWS-E Datasheet/PDF