2SK3662(F) Allicdata Electronics
Allicdata Part #:

2SK3662(F)-ND

Manufacturer Part#:

2SK3662(F)

Price: $ 0.00
Product Category:

Discrete Semiconductor Products

Manufacturer: Toshiba Semiconductor and Storage
Short Description: MOSFET N-CH 60V 35A TO220NIS
More Detail: N-Channel 60V 35A (Ta) 35W (Tc) Through Hole TO-22...
DataSheet: 2SK3662(F) datasheet2SK3662(F) Datasheet/PDF
Quantity: 1000
1 +: 0.00000
Stock 1000Can Ship Immediately
$ 0
Specifications
Vgs(th) (Max) @ Id: 2.5V @ 1mA
Package / Case: TO-220-3 Full Pack
Supplier Device Package: TO-220NIS
Mounting Type: Through Hole
Operating Temperature: 150°C (TJ)
Power Dissipation (Max): 35W (Tc)
FET Feature: --
Input Capacitance (Ciss) (Max) @ Vds: 5120pF @ 10V
Vgs (Max): ±20V
Gate Charge (Qg) (Max) @ Vgs: 91nC @ 10V
Series: U-MOSIII
Rds On (Max) @ Id, Vgs: 12.5 mOhm @ 18A, 10V
Drive Voltage (Max Rds On, Min Rds On): 4V, 10V
Current - Continuous Drain (Id) @ 25°C: 35A (Ta)
Drain to Source Voltage (Vdss): 60V
Technology: MOSFET (Metal Oxide)
FET Type: N-Channel
Part Status: Obsolete
Packaging: Bulk 
Description

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The 2SK3662(F) is a single-Drain-Channel Enhancement-Mode Field-Effect Transistor (FET). It functions by controlling the voltage or current flow to a circuit, given the presence of an input voltage or current. The main application of the 2SK3662(F) is for electronic switches, amplifiers, voltage regulators and other electronic devices in the industrial and automotive markets.

Unlike junction field-effect transistors (JFETs), the 2SK3662(F) FETs work using the Dielectric Insulation Layer Semiconductor (DIL) principle that applies a negative gate voltage to open or close a channel. The basic premise of the DIL principle is that the application of the negative gate voltage changes the capacitance between the gate and drain of the device, which in turn changes the flow, thus controlling the current. This enables the transistor to act as a switch or an amplifier.

The 2SK3662(F) FET has a low power consumption and is capable of operating up to 65 WE on-time. Its fast switching time of 0.4μs and its high reliability, high breakdown voltage and high withstand voltage make it suitable for a variety of applications. It is also quite inexpensive compared to other FETs, and it is easier to find replacement devices.

The 2SK3662(F) has a high power dissipation and insulation capability, making it suitable for use in high voltage applications. It also has high noise immunity, making it suitable for low noise applications such as communication systems and audio equipment. The wide Vgs range of -2 to -6 V makes it suitable for a variety of applications.

The structure of the 2SK3662(F) are formed by a double gate oxide and p layers. The p layers are separated by an oxide layer, which acts as an insulating layer, thus allowing for the control of current flow and voltage. The gate oxide layer is screened with a n type source and drain to reduce the leakage current between the source and the drain. Furthermore, the Metal Gate Electrode (MGE) technology allows for a greater current control over the electrons in the channel.

In summary, the 2SK3662(F) is a single-Drain-Channel Enhancement-Mode FET, commonly used for electronic switches, amplifiers, voltage regulators and other electronic devices. It works using the Dielectric Insulation Layer Semiconductor (DIL) principle and has a high power dissipation and insulation capability, as well as high noise immunity. The structure of the 2SK3662(F) is composed of a double gate oxide and p layers, and is screened with a n type source and drain that reduces the current leakage. Its wide Vgs range and high reliability, breakdown voltage, and withstand voltage make it an excellent choice for a variety of applications.

The specific data is subject to PDF, and the above content is for reference

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