NTTFS5811NLTAG Allicdata Electronics

NTTFS5811NLTAG Discrete Semiconductor Products

Allicdata Part #:

NTTFS5811NLTAGOSTR-ND

Manufacturer Part#:

NTTFS5811NLTAG

Price: $ 0.00
Product Category:

Discrete Semiconductor Products

Manufacturer: ON Semiconductor
Short Description: MOSFET N-CH 40V 53.6A 8DFN
More Detail: N-Channel 40V 17A (Ta), 53A (Tc) 2.7W (Ta), 33W (T...
DataSheet: NTTFS5811NLTAG datasheetNTTFS5811NLTAG Datasheet/PDF
Quantity: 1000
Stock 1000Can Ship Immediately
Specifications
Vgs(th) (Max) @ Id: 2.2V @ 250µA
Package / Case: 8-PowerWDFN
Supplier Device Package: 8-WDFN (3.3x3.3)
Mounting Type: Surface Mount
Operating Temperature: -55°C ~ 150°C (TJ)
Power Dissipation (Max): 2.7W (Ta), 33W (Tc)
FET Feature: --
Input Capacitance (Ciss) (Max) @ Vds: 1570pF @ 25V
Vgs (Max): ±20V
Gate Charge (Qg) (Max) @ Vgs: 31nC @ 10V
Series: --
Rds On (Max) @ Id, Vgs: 6.4 mOhm @ 20A, 10V
Drive Voltage (Max Rds On, Min Rds On): 4.5V, 10V
Current - Continuous Drain (Id) @ 25°C: 17A (Ta), 53A (Tc)
Drain to Source Voltage (Vdss): 40V
Technology: MOSFET (Metal Oxide)
FET Type: N-Channel
Part Status: Obsolete
Packaging: Tape & Reel (TR) 
Description

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NTTFS5811NL is one of a family of enhanced MOSFET transistors. Its main features include a low gate threshold voltage (Vgs(th)), low input capacitance, and fast switching. The main application of the device is for use in high voltage power switches, where it can be used to drive loads such as inductors and capacitors. It also has applications in high frequency radio systems.

The gate of the NTTFS5811NL is formed from a silicon oxide (SiO2) layer. The source and drain electrodes are held in place by metallic contacts. The gate of the device makes contact with the gate oxide and acts as a physical barrier between the source and drain. This prevents current from flowing through the channel until a pulsed voltage is applied to the gate.

The threshold voltage (Vgs(th)) of the NTTFS5811NL is typically around -4.5V to -5.5V. As the voltage is increased, the MOSFET enters its triode region. This is the region in which current starts to flow through the channel. As the voltage increases, so does the current through the device.

The working principle of the NTTFS5811NL is based on field-effect transistor (FET) operation. The gate of the device acts as an insulating layer between the source and drain electrodes. When a voltage is applied to the gate, it creates a field effect on the channel between the source and drain electrodes. Due to the field effect, the current flow through the device can be modulated by changing the voltage on the gate.

The NTTFS5811NL also has a low input capacitance, making it ideal for high frequency applications. The low input capacitance reduces switching losses and allows the device to operate at higher frequencies. Additionally, the low input capacitance increases the frequency range of the device.

In addition to its main application, the NTTFS5811NL can also be used for level shifting and signal buffering. Level shifting is when a voltage from one circuit is transferred to another circuit with different voltage levels. Signal buffering is when a signal is amplified or prevented from being affected by external sources.

In summary, the NTTFS5811NL is a family of enhanced MOSFET transistors with low gate threshold voltage, low input capacitance, and fast switching capabilities. The main application of the device is for use in high voltage power switches, and it also has applications in high frequency radio systems. In addition, the device can be used for level shifting and signal buffering.

The specific data is subject to PDF, and the above content is for reference

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