FQA10N80_F109 Allicdata Electronics
Allicdata Part #:

FQA10N80_F109-ND

Manufacturer Part#:

FQA10N80_F109

Price: $ 0.00
Product Category:

Discrete Semiconductor Products

Manufacturer: ON Semiconductor
Short Description: MOSFET N-CH 800V 9.8A TO-3P
More Detail: N-Channel 800V 9.8A (Tc) 240W (Tc) Through Hole TO...
DataSheet: FQA10N80_F109 datasheetFQA10N80_F109 Datasheet/PDF
Quantity: 1000
1 +: 0.00000
Stock 1000Can Ship Immediately
$ 0
Specifications
Series: QFET®
Packaging: Tube 
Part Status: Obsolete
FET Type: N-Channel
Technology: MOSFET (Metal Oxide)
Drain to Source Voltage (Vdss): 800V
Current - Continuous Drain (Id) @ 25°C: 9.8A (Tc)
Drive Voltage (Max Rds On, Min Rds On): 10V
Rds On (Max) @ Id, Vgs: 1.05 Ohm @ 4.9A, 10V
Vgs(th) (Max) @ Id: 5V @ 250µA
Gate Charge (Qg) (Max) @ Vgs: 71nC @ 10V
Vgs (Max): ±30V
Input Capacitance (Ciss) (Max) @ Vds: 2700pF @ 25V
FET Feature: --
Power Dissipation (Max): 240W (Tc)
Operating Temperature: -55°C ~ 150°C (TJ)
Mounting Type: Through Hole
Supplier Device Package: TO-3P
Package / Case: TO-3P-3, SC-65-3
Description

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Introduction

The FQA10N80_F109 is a N-channel enhancement mode field effect transistor (FET) that is used in various analog and digital circuits. It is widely used in the application of motor control, power management, switching and signal conversion applications. This FET is a robust device, making it suitable for high power and high-voltage applications. In addition, it is widely used as a driver for high-speed/high-density digital circuits. In order to understand the characteristics and working principles of the FQA10N80_F109, we must first understand the structure and functionality of the FET.

Structure of the FET

An FET is a three-terminal device with a channel that acts as a weakly conductive or sometimes a resistive element between its source and drain terminals. Its primary control terminal is the gate, which is used to regulate current flow through the channel. FETs are further classified into two main types, namely Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) and Junction Field Effect Transistors (JFETs). The FQA10N80_F109 is a MOSFET and it is a useful device in high voltage and high-power applications.

The structure of the FQA10N80_F109 consists of a semiconductor substrate, typically silicon which is also known as substrate. A gate oxide layer is deposited on the substrate, followed by a metal gate electrode. Lastly, a source and drain diffused region are formed by introducing impurities into the substrate. This forms a channel between the source and the drain regions.

Working Principle of the FQA10N80_F109

The working principle of the FQA10N80_F109 is based on the Coulomb force, a force caused by the charge of the metal gate electrode. When a voltage is applied to the gate terminal, an electric field is produced that is strong enough to attract charge carriers, electrons or holes to the gate oxide layer. This forms a conducting path or channel between the source and drain regions and allows current to flow.

The magnitude of the electric field and thus the current flowing through the channel is regulated by the applied gate voltage. Therefore, the gate voltage can be used to control the amount of current flowing through the device. The threshold voltage or Vth is the required gate voltage to start the current conduction, and the device is said to turn “on” if the gate voltage exceeds the Vth.

The FQA10N80_F109 also has a high input impedance, similar to other MOSFETs, which is defined as the ratio of the gate voltage to the resulting channel current. This high input impedance is an advantage in digital circuits, as the device does not draw current from the gate when the gate is charged.

Conclusion

In conclusion, the FQA10N80_F109 is a N-channel MOSFET that is used in various analog and digital circuits. It is robust and suitable for high voltage and high power applications, and finds application in motor control, power management, switching and signal conversion. The FET works on the Coulomb force, which is caused by the charge of the metal gate electrode. The FET has a high input impedance which is an advantage in digital circuits.

The specific data is subject to PDF, and the above content is for reference

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