Allicdata Part #: | SIRA02DP-T1-GE3TR-ND |
Manufacturer Part#: |
SIRA02DP-T1-GE3 |
Price: | $ 0.00 |
Product Category: | Discrete Semiconductor Products |
Manufacturer: | Vishay Siliconix |
Short Description: | MOSFET N-CH 30V 50A PPAK SO-8 |
More Detail: | N-Channel 30V 50A (Tc) 5W (Ta), 71.4W (Tc) Surface... |
DataSheet: | SIRA02DP-T1-GE3 Datasheet/PDF |
Quantity: | 1000 |
Vgs(th) (Max) @ Id: | 2.2V @ 250µA |
Package / Case: | PowerPAK® SO-8 |
Supplier Device Package: | PowerPAK® SO-8 |
Mounting Type: | Surface Mount |
Operating Temperature: | -55°C ~ 150°C (TJ) |
Power Dissipation (Max): | 5W (Ta), 71.4W (Tc) |
FET Feature: | -- |
Input Capacitance (Ciss) (Max) @ Vds: | 6150pF @ 15V |
Vgs (Max): | +20V, -16V |
Gate Charge (Qg) (Max) @ Vgs: | 117nC @ 10V |
Series: | TrenchFET® |
Rds On (Max) @ Id, Vgs: | 2 mOhm @ 15A, 10V |
Drive Voltage (Max Rds On, Min Rds On): | 4.5V, 10V |
Current - Continuous Drain (Id) @ 25°C: | 50A (Tc) |
Drain to Source Voltage (Vdss): | 30V |
Technology: | MOSFET (Metal Oxide) |
FET Type: | N-Channel |
Part Status: | Active |
Packaging: | Tape & Reel (TR) |
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The SIRA02DP-T1-GE3 is a transistor used in various electronic devices. It is a single, silicon, insulated-gate, field-effect transistor (IGFET) with a structure based on Silicon-On-Insulator (SOI) technology. This device is suitable for use in switching operations, as well as for amplifying, filtering and other applications.
The structure of the SIRA02DP-T1-GE3 consists of an n-type substrate, formed by the combination of a silicon substrate and an oxide layer that acts as an insulator, on top of which a gate-oxide layer is formed. On top of these elements, a metallic gate is placed, usually made from aluminum or polycrystalline silicon. Outside the gate, silicon of opposite polarity (p-type) is placed, completing the current-carrying part of the transistor. Both p-type and n-type regions form the drain and source contacts of the transistor. The device is also known as an MOSFET (metal-oxide-semiconductor field-effect transistor) because it is based on a metal-oxide-semiconductor structure.
The working principle of the SIRA02DP-T1-GE3 is based on the modulation of the drain current by the gate voltage. When a positive voltage is applied to the gate, it creates an internal electric field, which attracts holes from the p-type silicon. This results in an n-type region being created in the channel, allowing current to flow between the drain and the source. When the voltage on the gate is lowered, the electric field created dissipates, thus stopping the current flow. Therefore, this device can be used as a switch, as the current flow can be controlled by the application of a gate voltage.
The SIRA02DP-T1-GE3 can be used for various applications, such as high-speed switching, voltage regulation, and circuit protection. It can be used as a switch in power supplies, as a voltage regulator, and as a switch in audio circuits. It can also be used in power amplifiers, as a voltage-controlled resistor, or as a current regulator. The transistor is also very useful in telecom applications such as cell phones, and other consumer electronics such as TVs and DVD players.
In conclusion, the SIRA02DP-T1-GE3 single, silicon, insulated-gate, field-effect transistor is a versatile device that can be used for many types of applications. Its working principle is based on the modulation of drain current by the application of a gate voltage and, thus, it can be used as both a switch and a current regulator. This device can be used in a variety of consumer electronics, telecom, and other electronic devices.
The specific data is subject to PDF, and the above content is for reference
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