FDD850N10LD Discrete Semiconductor Products |
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Allicdata Part #: | FDD850N10LDTR-ND |
Manufacturer Part#: |
FDD850N10LD |
Price: | $ 0.37 |
Product Category: | Discrete Semiconductor Products |
Manufacturer: | ON Semiconductor |
Short Description: | MOSFET N-CH 100V 15.3A DPAK |
More Detail: | N-Channel 100V 15.3A (Tc) 42W (Tc) Surface Mount T... |
DataSheet: | FDD850N10LD Datasheet/PDF |
Quantity: | 1000 |
2500 +: | $ 0.34182 |
Series: | PowerTrench® |
Packaging: | Tape & Reel (TR) |
Part Status: | Active |
FET Type: | N-Channel |
Technology: | MOSFET (Metal Oxide) |
Drain to Source Voltage (Vdss): | 100V |
Current - Continuous Drain (Id) @ 25°C: | 15.3A (Tc) |
Drive Voltage (Max Rds On, Min Rds On): | 5V, 10V |
Rds On (Max) @ Id, Vgs: | 75 mOhm @ 12A, 10V |
Vgs(th) (Max) @ Id: | 2.5V @ 250µA |
Gate Charge (Qg) (Max) @ Vgs: | 28.9nC @ 10V |
Vgs (Max): | ±20V |
Input Capacitance (Ciss) (Max) @ Vds: | 1465pF @ 25V |
FET Feature: | -- |
Power Dissipation (Max): | 42W (Tc) |
Operating Temperature: | -55°C ~ 150°C (TJ) |
Mounting Type: | Surface Mount |
Supplier Device Package: | TO-252-5 |
Package / Case: | TO-252-5, DPak (4 Leads + Tab), TO-252AD |
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FDD850N10LD is a field-effect power transistor also known as a Metal Oxide Semiconductor Field Effect Transistor (MOSFET). It is used in a wide range of applications in different industries, such as powering servo motors, audio amplifiers, automotive electronics, and embedded systems.
MOSFETs are able to provide excellent performance as they feature low gate-source threshold voltage, low on-resistance, low capacitance, low input capacitance and fast response time, high playback bandwidth, and low power dissipation. Due to its excellent characteristics, FDD850N10LD is widely used in the power electronic devices industry.
The FDD850N10LD has an excellent thermal performance and is capable of handling large maximum current. It also features a thermal resistance of 175K/W, maximum current of 85 A, gate-source threshold voltage of 4V, and on-resistance of 0.5mΩ.
The working principle of the FDD850N10LD is based on the structure of its gate. The gate of the FDD850N10LD consists of two layers: Source, Drain, and Gate. The two layers are separated by a thin gate oxide layer. When a positive voltage is applied to the gate, the gate oxide layer is formed, thus allowing the flow of electric charge from the source to the drain.
The FDD850N10LD is an excellent choice for applications that require low gate-source threshold voltage, low on-resistance, low capacitance, low input capacitance, fast response time, and high playback bandwidth. It is widely used in the power electronics industry, automotive electronics, servo motors, audio amplifiers, and embedded systems.
The specific data is subject to PDF, and the above content is for reference
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